EAA Working Groups

 

WG 1: Aerosol Technology

 

Chair: Adam Boies

Aerosol technology includes the research and development fields ranging from conventional areas such as emission control, filtration and powder technology, to more recent ones such as advances in functional nanomaterials and Industry4.0 systems. Specific sub-topics could be but are not limited to: Material synthesis and structuring via aerosol/gas phase processes. Functional nanomaterials, e.g. coating and surface modification of nanoparticles. Nanostructured materials from aerosols including also films and coatings by aerosol deposition. Scaling-up: from lab-scale to industrial production via aerosol processing. Filtration and gas cleaning technologies. Electrical Phenomena. Charging and electrical effects. Electrosprays. Industrial and high temperature aerosols. Combustion aerosols and related emission control e.g. in the transport and energy sector.

Subtopics

  1. Synthesis, structuring and applications of functional nanoparticles

  2. Nanoparticle deposition and thin film formation

  3. Coating and surface modification of nanoparticles

  4. Process analysis and monitoring

  5. Electric effects including electrosprays and electric discharges

  6. Transportation aerosol emissions and control technologies

  7. High temperature aerosols and biomass combustion

  8. Filtration for functional materials, combustion and industrial aerosols

WG members

Überschrift 1

About GAeF

The "Gesellschaft für Aerosolforschung e.V." (GAeF) was founded in 1972 in order to promote all areas of aerosol research, to provide information on an interdisciplinary basis amongst members and the public, to provide an international forum for collaboration and support scientific education and teaching at all levels. GAeF has members from all over the world and encourages aerosol scientists to join the society.

Contact GAeF

Gesellschaft für Aerosolforschung e.V.

Postfach 45 04 05

50879 Köln

 

e-mail: info@gaef.de

2020 - Gesellschaft für Aerosolforschung e.V.